Página Inicial CNEA Laboratorio TANDAR Página Inicial TANDAR Historia del acelerador TANDAR Web interno Web mail
Inicio » Actividades I+D > Publicaciones 2019 > Spatio-Temporal Defect Generation Proces...
acta de conferencia
"Spatio-Temporal Defect Generation Process in Irradiated HfO2 MOS Stacks: Correlated Versus Uncorrelated Mechanisms"
Fernando Leonel Aguirre, Andrea Padovani, Alok Ranjan, Nagarajan Raghavan, Nahuel Vega, Nahuel Müller, Sebastián Matías Pazos, Mario Debray, Joel Molina, Kin Leong Pey and Félix Palumbo
Proc. of the "2019 IEEE International Reliability Physics Symposium" (IRPS), Hyatt Regency Monterey, Monterey, California, USA,, March 31-April 4, 2019.
Proc. of the 2019 IEEE International Reliability Physics Symposium (IRPS), IEEE (2019)
ISBN: 978-1-5386-9504-3 (Electronic)
978-1-5386-9505-0 (PoD)
In this paper, we analyze the dependence of the Weibull slope (ß) extracted from TDDB tests on HfO2 MOS capacitors (MOSCAPs) on the initial density of defects artificially induced by carefully tuned micro beam irradiation experiments with different carbon dosages. The consistent experimental trend of reducing p with increasing defect density was reproducible only with physics-based breakdown simulations that considered correlated defect generation in HfO2 and localized damage (partial percolation paths) traces created by the impinging ions. Scenarios of spatially random initial defect distribution and random stress-induced defect generation (in space and time) could not explain the experimental trends, confirming that correlated defect generation does exist in HfO2 thereby altering the conventional understanding of TDDB by quite a bit.
Av. Gral Paz y Constituyentes, San Martín, Pcia. de Buenos Aires, Argentina
Tel: (54-11) 6772-7007 - Fax: (54-11) 6772-7121